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Novel Vacuum Deposited Dielectric Materials for Capacitor Devices

Award Information
Agency: Department of Defense
Branch: Air Force
Contract: FA8650-05-M-2516
Agency Tracking Number: O043-EP7-1127
Amount: $99,770.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: OSD04-EP7
Solicitation Number: 2004.3
Timeline
Solicitation Year: 2004
Award Year: 2004
Award Start Date (Proposal Award Date): 2005-01-28
Award End Date (Contract End Date): 2005-07-28
Small Business Information
3334 Brown Station Road
Columbia, MO 65202
United States
DUNS: 179502216
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Michael Nichols
 President
 (573) 474-5522
 plasmanick@msn.com
Business Contact
 Beatrice Nichols
Title: Vice President
Phone: (573) 474-5522
Email: beanichols@hotmail.com
Research Institution
N/A
Abstract

Organic film polymers have been the dielectric of choice for high voltage, microsecond-discharge, high energy density capacitors. Electron traps normally found in these films limits their maximun voltage breakdown strength, engergy density, and dissipation. The objective of this proposal is to demonstrate the feasibility of producing higher performance polymer-like dielectric materials without catalysts, impurities, solvents, or antioxidants using ionized cluster beams in conjunction with conventional vacuum deposition techniques.

* Information listed above is at the time of submission. *

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