SECOND GENERATION LEAD CVD PRECURSORS FOR PBTIO3

Award Information

Agency: National Science Foundation	Branch: N/A	Award ID: 27326	Program Year/Program: 1997 / SBIR
Agency Tracking Number: 27326	Solicitation Year: N/A	Solicitation Topic Code: N/A	Solicitation Number: N/A

Small Business Information: Advanced Technologies/Laboratories Intl
Advanced Technologies/Lab Intl 20010 Century Blvd, Ste 500 Germantown, MD 20874 0111
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Minority-Owned: Yes

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Phase 2: Fiscal Year: 1997

Title: SECOND GENERATION LEAD CVD PRECURSORS FOR PBTIO3

Agency: NSF

Contract: N/A

Award Amount: $300,000.00

Abstract:
CHEMICAL VAPOR DEPOSITION (CVD) OF LEAD-BASED FERROELECTRICS SUCH AS LEAD TITANATE, LEAD ZIRCONATE TITANATE (PZT), AND LEAD LANTHANUM ZIRCONATE TITANATE (PLZT), IS THE MOST PROMISING MANUFACTURING METHOD FOR A WIDE VARIETY OF NEXT GENERATION ELECTRONIC DEVICES INCLUDING RADIATION-HARD NON-VOLATILE MEMORIES, ELECTRO-OPTIC SPATIAL LIGHT MODULATORS, PIEZOELECTRIC ACTUATORS, AND PYROELECTRIC INFRARED DETECTORS. THE USE OF THIS TECHNIQUE IN A MANUFACTURING ENVIRONMENT IS CURRENTLY LIMITED BY THE INADEQUACY OF CURRENT SOURCE REAGENTS (LOW VOLATILITY OR HIGH TOXICITY). RESEARCHERS ARE INVESTIGATING NEW LEAD PRECURSORS SPECIFICALLY DESIGNED TO MEET BOTH FILM GROWTH AND SAFETY REQUIREMENTS.

Principal Investigator:
Douglas C Gordon
2037941100

Business Contact:

Small Business Information at Submission:

Advanced Technology Materials
7 Commerce Dr Danbury, CT 06810

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Minority-Owned: No

HUBZone-Owned: No