Gas-Phase Deposition of Low Dielectric Polymers

Award Information

Agency: Department of Defense	Branch: Missile Defense Agency	Award ID: 28356	Program Year/Program: 1995 / SBIR
Agency Tracking Number: 28356	Solicitation Year: N/A	Solicitation Topic Code: N/A	Solicitation Number: N/A

Small Business Information: Advanced Technologies/Laboratories Intl
Advanced Technologies/Lab Intl 20010 Century Blvd, Ste 500 Germantown, MD 20874 0111
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Woman-Owned: Yes

Minority-Owned: Yes

HUBZone-Owned: No

Phase 1: Fiscal Year: 1995

Title: Gas-Phase Deposition of Low Dielectric Polymers

Agency / Branch: DOD / MDA

Contract: N/A

Award Amount: $60,000.00

Abstract:
Phase I will develop a gas-phase process for the deposition of low dielectric constant polymers for use in integrated circuits. This process will utilize the firm's liquid delivery technology to deliver the reactants and grow films at high deposition rates. Polymerization will be induced by thermal activation on a heated substrate. This novel approach to polymeric film growth enables the deposition of a wide variety of polymers displaying low dielectric constants. This technique has broad applications for IC packaging, lithography and microelectronics processing.

Principal Investigator:
Thomas H. Baum
2037941100

Business Contact:

Small Business Information at Submission:

Advanced Technology Materials
7 Commerce Dr Danbury, CT 06810

EIN/Tax ID:

DUNS: N/A

Number of Employees:

Woman-Owned: No

Minority-Owned: No

HUBZone-Owned: No