You are here

PHOTO CHEMICAL VAPOR DEPOSITION OF BARIUM TITANATE

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: N/A
Agency Tracking Number: 21572
Amount: $50,000.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Timeline
Solicitation Year: N/A
Award Year: 1993
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
7 Commerce Dr
Danbury, CT 06810
United States
DUNS: N/A
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Jiming Zhang
 (203) 794-1100
Business Contact
Phone: () -
Research Institution
N/A
Abstract

FERROELECTRICS SHOW GREAT PROMISE AS ELECTRONIC MATERIALS IN APPLICATIONS RANGING FROM INFRARED DETECTORS TO OPTICAL SWITCHES. BRIUM TITANATE (BATIO3) IS AN ESPECIALLY PROMISING MATERIAL FOR THIN FILM CAPACITOR APPLICATIONS IN ULTRA-LARGE SCALE INTEGRATED CIRCUITS. CONVENTIONAL CHEMICAL VAPOR DEPOSITION (CVD) PROCESSING OF BATIO3 THIN FILMS REQUIRES TEMPERATURES THAT ARE INCOMPATIBLE WITH STANDARD SILICON PROCESSING TECHNOLOGY. PLASMA ENHANCED CVD OF BATIO3 SHOWS SOME POTENTIAL FOR LOWERING TEMPERATURES, BUT IT IS DIFFICULT TO ACHIEVE LARGE-SCALE UNIFORMITY. BOTH THE NON-UNIFORMITY AND TEMPERATURE PROBLEMS MAY BE SOLVED BY THE USE OF A NOVEL PHOTO-ENHANCED CVD PROCESS WHOSE FEASIBILITY WILL BE DETERMINED IN THIS STUDY.

* Information listed above is at the time of submission. *

US Flag An Official Website of the United States Government