HIGH CONCENTRATION OZONE PRODUCTION FOR SEMICONDUCTOR MANUFACTURING

THE OBJECTIVE OF THIS RESEARCH IS TO EXPLORE THE FEASIBILITY OF DEVELOPING COMPACT, HIGH CONCENTRATION, OZONEGENERATION EQUIPMENT FOR THE DEMANDING REQUIREMENTS OF THE SEMICONDUCTOR MANUFACTURING AND MATERIALS PROCESSING INDUSTRY. EMERGING PROCESSING TECHNOLOGIES USING OZONE CHEMISTRY HAVE GIVEN RISE TO THE NEED FOR SUCH EQUIPMENT. CURRENT GENERATORS ARE INADEQUATE FOR THE TASK AND TOO LARGETO BE INSTALLED IN THE CLEAN ROOM ENVIRONMENT NEXT TO A CVD SYSTEM OR OTHER SEMICONDUCTOR TOOL. CURRENT DOUBLE-COOLED GENERATOR DESIGNS ALSO REQUIRE A DIELECTRIC COOLANT AND A DEDICATED RECIRCULATING OIL COOLING SYSTEM TO REMOVE HEAT FROM THE GENERATOR ELECTRODES. THE EXPERIMENTAL PROGRAM IN PHASE I WILL BE DIRECTED TOWARD ESTABLISHING THE FEASIBILITYOF DEVELOPING A COMPACT GENERATOR MODULE AND EXCITATION SOURCE WITH THE REQUIRED PERFORMANCE. PHASE II WILL BE DIRECTED TOWARD THE CONSTRUCTION OF A FULL SCALE PROTO-TYPE. IF SUCCESSFUL, THIS PROGRAM WILL LEAD TO THE DEVELOPMENT OF A CRITICAL MANUFACTURING RESOURCE FOR USE IN THE FABRICATION OF THE NEXT GENERATION OF SEMICONDUCTOR DEVICES.