USA flag logo/image

An Official Website of the United States Government

Non-toxic process for depositing highly-dense, corrosion-resistant aluminum on…

Award Information

Agency:
Department of Defense 		Branch:
Navy 		Award ID:
82794 		Program Year/Program:
2007 / SBIR
Agency Tracking Number:
N072-115-0392 		Solicitation Year:
N/A 		Solicitation Topic Code:
N/A 		Solicitation Number:
N/A
Small Business Information
Alameda Applied Sciences Corporation
3077 Teagarden St. San Leandro, CA 94577-5720
View profile »
Woman-Owned: No
Minority-Owned: Yes
HUBZone-Owned: No
 
Phase 1
Fiscal Year: 2007
Title: Non-toxic process for depositing highly-dense, corrosion-resistant aluminum on complex geometry components
Agency / Branch: DOD / NAVY
Contract: N68335-07-C-0438
Award Amount: $80,000.00
 

Abstract:

Alameda Applied Sciences Corporation (AASC) proposes dry, non-toxic, plasma-based hybrid energetic ion deposition and implantation process to prepare highly-dense, corrosion-resistant aluminum on complex geometry aircraft components. By replacing electroplated Low Hydrogen Embrittlement cadmium (LHE-Cd), a highly toxic metal and known carcinogen with serious ES&H issues, AASC's non-toxic process can reduce compliance costs associated with mounting regulatory burdens and reduce the scope of potential legal liabilities faced by today's Navy. Ion vapor deposition (IVD) and sputtered aluminum, currently used as LHE-Cd replacements, are low energy PVD methods that suffer from columnar microstructures with lower grain boundary density that provide fast diffusion pathways for the anions and cations in corrosion reactions. Burnishing, peening or bead blasting post-processing steps are required to achieve full density, adding cost and reducing throughput. Comparatively, AASC's hybrid energetic ion deposition and implantation process collapse voids, breaks up columnar microstructures, and produces uniformly dense aluminum layers that will offer superior corrosion performance and avoid post-deposition steps. Further, the use of cathodic arc plasma sources, relative to evaporative (IVD) or sputtering sources, enables much higher rates of deposition.

Principal Investigator:

Jason Wright
Scientist
5104834156
wright@aasc.net

Business Contact:

Mahadevan Krishnan
President
5104834156
krishnan@aasc.net
Small Business Information at Submission:

ALAMEDA APPLIED SCIENCES CORP.
626 Whitney Street San Leandro, CA 94577

EIN/Tax ID: 943201700
DUNS: N/A
Number of Employees:
Woman-Owned: No
Minority-Owned: No
HUBZone-Owned: No