Ultra-fast Broadband Low-cost T/R Switches based on Vanadium Dioxide Metal-insulator Transition Materials
Over the course of this small business innovative research (SBIR) phase 1 (Ph1) program Metamagnetics proposes the development of next generation ultra-fast and broadband T/R switches with high isolation (>30 dB) based on thin films of vanadium dioxide (VO2) metal-insulator transition (MIT) materials produced via pulsed laser deposition method. The crystalline uniformity of these films will be strictly monitored via controlled deposition parameters including oxygen pressure, substrate distance from target, and laser power. This will ensure the best quality oxide films as in the fabrication of T/R switches crystalline uniformity as well as the design of the R/F microwave switch have both been shown to be crucial elements of the switching speed and isolation bandwidth performance. In fact, sub pico-second responses have been theorized for VO2 based T/R switches when more efficient RF microwave designs are utilized which is a marked improvement over existing MEMs and GaN T/R switch technologies. Other advantages of switches based on VO2 MIT materials include low fabrication costs, low insertion losses, and high isolation over broad bandwidths of operation. Together, these attribute make the development of VO2 switches based on MIT materials a very attractive solution for next generation T/R switch applications.
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