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ADROIT MATERIALS, INC.

Company Information
Address
3001 GREYHAWK PL
APEX, NC 27539-9314
United States


http://adroitmaterials.com

Information

UEI: LSK7AWA81NA1

# of Employees: 8


Ownership Information

HUBZone Owned: No

Socially and Economically Disadvantaged: No

Woman Owned: No



Award Charts




Award Listing

  1. 1.2 kV class GaN on GaN vertical U-MOSFET with reach through protection and shielding by Mg implantation

    Amount: $200,000.00

    C56-20a-273160Machine driven processes such as pumps, fans, compressed air, and materials handling and processing accounted for 68% of electricity use (2,840 TBtu direct use) by U.S. manufacturing in ...

    SBIRPhase I2023Department of Energy
  2. Defect-controlled AlGaN APDs for UV photon counting and space exploration

    Amount: $150,000.00

    The proposed work aims to demonstrate significant improvement in AlGaN-based detectors and detector arrays by employing single crystal AlN substrates, which practically eliminates leakage induced by s ...

    SBIRPhase I2023National Aeronautics and Space Administration
  3. High Power UVC Light Emitting Diodes for Disinfection Applications

    Amount: $1,315,219.00

    Based on the successful completion of the Phase II effort that demonstrated state-of-the-art UVC LEDs with emission around 265 nm and output power of 25 mW (unpackaged device), a continuation of this ...

    STTRPhase II2023Department of Defense Army
  4. Solar blind UVC and VUV detectors

    Amount: $140,000.00

    As an alternative to MCPs and PMTs, it is proposed to use AlGaN-based UV detectors. These detectors are based on ultra-wide bandgap AlGaN, which allows for solar blind detection of light with waveleng ...

    SBIRPhase I2023Department of Defense Navy
  5. kV-class GaN-based Junction Barrier Schottky diodes using ion implantation

    Amount: $250,000.00

    The objective of this work is to demonstrate GaN-based Junction Barrier Schottky (JBS) diodes using a novel ion implantation process developed in previously ARPA-E funded projects. The centerpiece of ...

    SBIRPhase I2021Department of Energy ARPA-E
  6. kV-class GaN-based Junction Barrier Schottky diodes using ion implantation

    Amount: $250,000.00

    The objective of this work is to demonstrate GaN-based Junction Barrier Schottky (JBS) diodes using a novel ion implantation process developed in previously ARPA-E funded projects. The centerpiece of ...

    SBIRPhase II2021Department of Energy ARPA-E
  7. Ion implantation-enabled fabrication of AlN based Schottky diodes

    Amount: $250,000.00

    The objective of this work is to develop AlN-based Schottky diodes with electrical properties that will drastically reduce forward conduction losses compared to existing high-power diodes. This object ...

    SBIRPhase I2021Department of Energy ARPA-E
  8. Ion implantation-enabled fabrication of AlN based Schottky diodes

    Amount: $250,000.00

    The objective of this work is to develop AlN-based Schottky diodes with electrical properties that will drastically reduce forward conduction losses compared to existing high-power diodes. This object ...

    SBIRPhase II2021Department of Energy ARPA-E
  9. Novel, Deep-UV APDs for Atomic Clocks and Space Observation

    Amount: $750,000.00

    The target of this project is to develop a compact and efficient avalanche photodiode (APD) based on Al rich AlGaN to replace incumbent photomultiplier tubes in atomic clocks. The advance over existin ...

    SBIRPhase II2021National Aeronautics and Space Administration
  10. Novel, Deep-UV APDs for Atomic Clocks and Space Observation

    Amount: $124,999.00

    The target of this project is to develop a compact and efficient avalanche photodiode (APD) based on Al-rich AlGaN to replace currently used photomultiplier tubes in atomic clocks. The advance over ex ...

    SBIRPhase I2020National Aeronautics and Space Administration
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