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Passivation Method for Aluminum Nanoparticles

Award Information
Agency: Department of Defense
Branch: Army
Contract: W15QKN-12-C-0021
Agency Tracking Number: A112-089-0415
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: A11-089
Solicitation Number: 2011.2
Timeline
Solicitation Year: 2011
Award Year: 2012
Award Start Date (Proposal Award Date): 2011-11-16
Award End Date (Contract End Date): N/A
Small Business Information
12345 W. 52nd Ave.
Wheat Ridge, CO -
United States
DUNS: 181947730
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Girish Srinivas
 Principal Engineer
 (303) 940-2321
 gsrinivas@tda.com
Business Contact
 John Wright
Title: Vice President
Phone: (303) 940-2300
Email: jdwright@tda.com
Research Institution
 Stub
Abstract

Due to its favorable combustion properties, aluminum is the material of choice in metalized nanoparticle formulations for energetic materials; however, the full potential of aluminum nanoparticles has not been realized due to the presence of a nascent oxide layer (Al2O3) that surrounds the nanoparticles and retards combustion. As a result, the military needs novel passivation techniques that have a minimal effect on the combustion properties but still protect the native Al-metal from oxidation under ambient conditions. TDA Research, Inc. (TDA) proposes to develop surface modification chemistry for passivating bare Al-nanoparticles (i.e., Al-nanoparticles that will not form a surface oxide-layer). Using a combination of computational methods and experimental chemistry, TDA will develop surface passivation chemistry that will protect the native Al-metal nanoparticles from oxidation and thereby enhance their reactivity. By developing novel Al-surface chemistry that will passivate bare Al-nanoparticles without the formation of a non-reactive oxide layer, we will develop an air-stable Al-nanoparticle that has a decreased passivation layer thickness and thus will be more reactive.

* Information listed above is at the time of submission. *

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