CHEMICAL VAPOR DEPOSITION (CVD) IS A UNIQUE TECHNOLOGY FOR FABRICATING MATERIALS WHICH CAN PROVIDE EXTERNAL PROTECTION FROM LASER AND OTHER DIRECTED ENERGY SOURCES AS WELL AS KINETIC ENERGY HARDENING AND NUCLEAR RADIATION PROTECTION FOR ELECTRONICS.

CHEMICAL VAPOR DEPOSITION (CVD) IS A UNIQUE TECHNOLOGY FOR FABRICATING MATERIALS WHICH CAN PROVIDE EXTERNAL PROTECTION FROM LASER AND OTHER DIRECTED ENERGY SOURCES AS WELL AS KINETIC ENERGY HARDENING AND NUCLEAR RADIATION PROTECTION FOR ELECTRONICS. IT HAS ALREADY BEEN DEMONSTRATED THAT ULTRAMET'S A200 COATING FABRICATED BY CVD IS THE 'HARDEST' MATERIAL TESTED TO DATE UNDER LASER RADIATION. IN THIS PROGRAM ULTRAMET PROPOSES TO DEMONSTRATE THE FEASIBILITY OF LOADING A LOW DENSITY CARBON FELT MATERIAL WITH A CONCENTRATION GRADIENT OF A REFRACTORY METAL CARBIDE (WC) TO PROVIDE ENERGY ABSORBING MATERIAL AT THE ENERGY INCIDENT SURFACE WHILE MINIMIZING THE THERMAL CONDUCTIVITY TO THE BACK (MILLILE ATTACHMENT) SURFACE. THE INCIDENT SURFACE WILL ALSO BE COATED WITH A HIGHLY REFLECTIVE MATERIAL, A200 AND EVALUATION WILL BE PERFORMED UNDER LASER RADIATION.