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HIGH ACCURACY FLOW CONTROLLER FOR PROCESS CONTROL OF CHEMICAL VAPOR DEPOSITION

Award Information
Agency: National Science Foundation
Branch: N/A
Contract: N/A
Agency Tracking Number: 21732
Amount: $300,000.00
Phase: Phase II
Program: SBIR
Solicitation Topic Code: N/A
Solicitation Number: N/A
Timeline
Solicitation Year: N/A
Award Year: 1995
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): N/A
Small Business Information
20 New England Business Ctr
Andover, MA 01810
United States
DUNS: N/A
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Karen L Carleton
 (508) 689-0003
Business Contact
Phone: () -
Research Institution
N/A
Abstract

RESEARCHERS ARE DEVELOPING A COMPACT FLOW SENSOR FOR HIGH ACCURACY SEMICONDUCTOR PROCESS CONTROL. THIS SENSOR IS BASED ON A NEW VARIATION OF INFRARED (IR) ABSORPTION SPECTROSCOPY CALLED SPECTRAL CORRELATION DETECTION. THE REACTANT CONCENTRATION IS QUANTIFIED BY IR ABSORPTION TO CONTROL REACTANT FLOW RATES FOR DEPOSITION OR ETCHING APPLICATIONS. THIS DIRECT IR MESUREMENT CONTRASTS WITH CURRENT METHODS WHICH INDIRECTLY METER SPECIS FLOW RATES. WHILE THE SYSTEM IS ASSEMBLED AND CALIBRATED FOR MODEL METAL ALKYL COMPOUNDS, SUCH AS TRIMETHYLGALLIUM, THIS IR SENSOR IS VERSATILE AND CAN BE APPLIED TO A WIDE VARIETY OF DEPOSITION OR ETCHING SPECIES.

* Information listed above is at the time of submission. *

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