Fourier Synthesis Lithographic Machine for Large Panel D Display Fabrication

Physical Optics Corp (POC) proposes a novel approach to lithography for the fabrication of flat panel displays. The basic idea is the Fourier synthesis of the lithographic pattern through sequential recording of sinusoidal harmonics. Fourier synthesis does not increase the total exposure time. Potential benefits of our innovative approach include: no-mask lithography (fabrication immediately follows design, using CAD-generated layout); greatly increased throughout when compared to stepper machines (a large area is exposed at once); no diffraction blurring as in proximity printing; extremely high effective numerical aperture; spatial resolution smaller than a wavelength (the smallest grating period that can be recorded is unattainable with conventional optics); very small number of moderate-quality optical components required; the depth of focus significantly increased compared to conventional systems; easy alignment. POC realizes that the proposed approach differs significantly from the current technological thrust. However, in order to dramatically improve our nation's competitiveness in large panel display manufacturing, a non-incremental approach is called for. This fits the Defense Policy Objectives for National Technology Base in "ensuring technological superiority over potential adversaries" (10 USC 2501 (a)(3)). Anticipated Benefits: The inherent simplicity of the proposed technique will lead to machines being marketed at a very moderate cost, probably under $200,000. This will encourage many smaller companies to pursue the very lucrative large panel display market, thereby creating a strong demand for POC's machines.