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Efficient manufacture of extreme surface area Microchannel plate devices functionalized by atomic layer deposition thin films

Award Information
Agency: Department of Energy
Branch: N/A
Contract: DE-FG02-10ER85784
Agency Tracking Number: 94806
Amount: $100,000.00
Phase: Phase I
Program: SBIR
Solicitation Topic Code: 61 a
Solicitation Number: DE-FOA-0000161
Timeline
Solicitation Year: 2010
Award Year: 2010
Award Start Date (Proposal Award Date): N/A
Award End Date (Contract End Date): 2011-03-18
Small Business Information
142 North Road Suite F-150
Sudbury, MA 01776
United States
DUNS: 168792260
HUBZone Owned: No
Woman Owned: No
Socially and Economically Disadvantaged: No
Principal Investigator
 Neal Sullivan
 Mr.
 (888) 949-4441
 nsullivan@arradiance.com
Business Contact
 Kenneth Stenton
Title: Mr.
Phone: (978) 369-8291
Email: kstenton@arradiance.com
Research Institution
N/A
Abstract

The work proposed in this SBIR proposal is intended to follow the basic R&D effort of a consortium of national laboratories, universities, and industry, led by Argonne National Laboratory and the University of Chicago for the development of new, large area, photo-detector devices. This project proposes to address the commercialization gap that exists between the proof-of-principle large area photo-detector (LAPD) program and the efficient manufacture of large area Microchannel plate devices using atomic layer deposition (ALD). For programs such as the Deep Underground Science and Engineering Laboratory (DUSEL) project and other applications in high energy physics, medical discovery and diagnostics and homeland security applications this will be transformational. Arradiance, as the key commercial ALD component of the Argonne LAPD collaboration, will develop productive recipes, without sacrificing MCP performance, for the LAPD device. In parallel, Arradiance will develop production equipment that can effectively and efficiently produce the large area MCP devices, in which a single 8

* Information listed above is at the time of submission. *

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